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Pattern Development 2 (APRL 2350)
Total Credits:
3
Lecture Credits:
1
Lab Credits:
2
Description:
This course will provide you with the technical skills essential for developing industry standard patterns for complex designs. You will analyze, develop and construct patterns for notched collars, kimono sleeves, and torso- and sheath-style garments. You will identify and apply dart manipulation methods and construct original patterns. Must be taken A-F.
Topical Outline:
1. Industry pattern standards
2. Industrial pattern labeling
3. Fit standards
4. Dart manipulation and style line methods
5. Complex pattern design
6. Original garment design and development
Learning Outcomes:
1. Identify basic and complex garment patterns
2. Implement dart manipulation and style line methods to basic sloper
3. Analyze the fit of garments and perform corrective adjustments
4. Develop patterns according to industry standards
5. Analyze and develop complex pattern designs
6. Develop, fit and adjust original pattern designs
Prerequisites:
APRL 1000,
APRL 1025,
APRL 1100, and
APRL 1360
Co-requisites:
APRL 1400,
APRL 2150, and
APRL 2750